Steed R&D Product Line
A full line of small batch and research horizontal furnace systems set up for a variety of process solutions. Wafer size ranging from 75-300mm, manual or automatic loading and from single tube up to eight tube systems.
Steed ST Product Line
This design is fully self-contained in a single frame and includes an integral gas supply module. The system may be used for diffusion, oxidation and LPCVD processing of 3″-6″ substrates.