Taisei Giken TRAPPACK particle traps remove particulate by-products from the exhaust effluents generated by Semiconductor and TFT LCD manufacturing processes, ion implantation, etching, CVD, etc.
Sub-micron (especially fine) particles of below 1 micron exhausted from CVD devices can be completely shut out by centrifugal coil swirling and our proprietary engineered element.
As there is almost no conductance loss, the TRAPPACK can be applied to either the fore line or exhaust line of the vacuum pump. It is a revolutionary powder trap to treat the sub-micron particles which conventional traps can not remove. Reduce maintenance frequency and increase productivity.
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