Particle Abatement

Taisei Giken TRAPPACK

Our particle traps remove particulate by-products from the exhaust effluents generated by Semiconductor and TFT LCD manufacturing processes.

Especially fine particles of below 1 micron exhausted from CVD devices can be completely shut out by centrifugal coil swirling and our proprietary engineered element.

As there is almost no conductance loss, our device can be applied to either fore line or exhaust line of the vacuum pump. It is a revolutionary powder trap to treat the fine particles which conventional traps could not remove. You can reduce maintenance frequency and obtain increased productivity.

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Vacuum Side specifications
(Installed at Fore-line of Vacuum Pump)

Exhaust side specifications
(Installed at Exhaust-line of Vacuum Pump)

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